Also, many researchers focused on how a polymer decomposes under plasma attack. As we know, plasma etching is a process of physical bombardment and chemical reaction. A surface is exposed to fluxes of atoms, molecules, ions, electrons, and photons, which break the chemical bonds and react with elements at the interface of the gas and the solid [2]. In the gas phase, the energy of particles, gas concentration, gas residence time, and the rate of sweeping away active species are all factors that determine the efficiency of the bombardment and reaction. For the solid, chemical composition and bonding type both affect the etch process. Many papers have presented studies of polymer surface change after plasma etching using Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), real-time mass spectrometry (MS), and secondary ion mass spectrometry (SIMS) [10, 11, 12]. However, becauseplasma etching is a very aggressive and fast process, it is difficult to catch the information using normal analysis instruments.